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ALD and Characterization of Aluminum Oxide Deposited on Si(100) Using Tris(diethylamino) Aluminum and Water Vapor
Katamreddy, Rajesh; Inman, Ronald; Jursich, Gregory; Soulet, Axel; Takoudis, Christos
(
Electrochemical Society
,
2006-08
)
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(40KB)
Cyclic Chemical-Vapor-Deposited TiO2/Al2O3 Film Using Trimethyl Aluminum, Tetrakis(diethylamino)titanium, and O2
Song, Xuemei; Takoudis, Christos G
(
Electrochemical Society
,
2007-06
)
PDF
(505KB)
Selective atomic layer deposition of HfO2 on copper patterned silicon substrates
Tao, Qian; Jursich, Gregory; Takoudis, Christos
(
American Institute of Physics
,
2010
)
PDF
(272KB)
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