Modeling and Simulation of Long-Wave Infrared InAsGaSb Strained Layer Superlattice Photodiodes with Different Passivants - Revised Manuscript.pdf (233.17 kB)Download file
Modeling and Simulation of Long‐Wave Infrared InAs/GaSb Strained Layer Superlattice Photodiodes with Different Passivants
journal contributionposted on 2012-08-17, 00:00 authored by Koushik Banerjee, Jun Huang, Siddhartha Ghosh
Current-voltage characteristics of long-wave infrared (LWIR) InAs/GaSb strained layer superlattice photodiodes (cut-off wavelength ~10 μm), passivated with different surface passivants, have been modeled and simulated using ATLAS software from SILVACO. The simulated results are fitted to previous experimental results obtained on unpassivated devices and those passivated by silicon-dioxide (SiO2), silicon nitride (SixNy) and zinc sulfide (ZnS). Surface parameters in terms of surface recombination velocity, shunt resistance and interface trap density are extracted for different passivants. The performance of silicon-dioxide passivated diode is solely dominated by a shunt leakage path with a shunt resistance value of 0.56 Ω-cm2. Extracted electron and hole surface recombination velocities have values of 105 cm/s and 107 cm/s for unpassivated, 103 cm/s and 105 cm/s for SixNy passivated and 102 cm/s and 103 cm/s for ZnS passivated devices. Interface trap density follows a similar trend with values of 1015 cm-2, 8.5×1014 cm-2 and 1010 cm-2 for unpassivated, SixNy passivated and ZnS passivated devices respectively. The suitability and limitations of the simulation tool are discussed.
Publisher StatementNOTICE: this is the author’s version of a work that was accepted for publication in Infrared Physics and Technology. Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms may not be reflected in this document. Changes may have been made to this work since it was submitted for publication. A definitive version was subsequently published in Infrared Physics and Technology, Vol 54, Issue 6 , (NOV 2011) http://dx.doi.org/10.1016/j.infrared.2011.08.003