posted on 2015-10-21, 00:00authored byKhodr Maamari
We have developed a new state of the art high aspect ratio 3D fabrication
technique based on the electron-beam lithography system (EBL) available at
the NCF UIC. This new 3D method has allowed us to fabricate structures
with a resolution on the order of magnitude better than those available
now in the market, such as 3D printers. The process requires a multiple
parameter optimization, including exposure dose modulation, the number of
the resist layers; thermal processing etc., and requires not only
knowledge of electron beam interaction, electron backscattering, but also
the understanding of physics and chemistry of the resist on the nanoscale.
There are only a handful groups in the world that are capable of
fabricating high aspect ratio 3D nanostructures with resolution on the
order of few nanometer. Our new 3D approach paved the road for future
research that requires high aspect ratio 3D nanostructures especially
those aimed for biomedical applications.
History
Advisor
Metlushko, Vitali
Department
Electrical and Computer Engineering
Degree Grantor
University of Illinois at Chicago
Degree Level
Doctoral
Committee Member
Abiade, Jeremiah
Stroscio, Michael
Cho, Michael
Indacochea, Ernesto