University of Illinois Chicago
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Fundamental studies on alternative high-kappa gate dielectric materials.

thesis
posted on 2025-05-30, 12:45 authored by Anand S. Deshpande
Fundamental studies on alternative high-kappa gate dielectric materials.

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Degree Grantor

University of Illinois at Chicago.

Degree Level

  • Doctoral

Language

  • en

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    Keywords

    Engineering, Chemical.

    Licence

    In Copyright

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